The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2011
Filed:
Jun. 20, 2006
Maurits Van Der Schaar, Veldhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Everhardus Cornelis Mos, Best, NL;
Stefan Carolus Jacobus Antonius Keij, Breda, NL;
Maurits Van Der Schaar, Veldhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Everhardus Cornelis Mos, Best, NL;
Stefan Carolus Jacobus Antonius Keij, Breda, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An overlay target on a substrate includes two sets of gratings; the first set having a pitch Pand the second set having a pitch Pand each set including a grating with an orientation substantially perpendicular to the first grating of each set. When a layer of resist is to be aligned with the layer below it, the same overlay marks are provided on the upper layer and the relative positions of the overlay targets on the upper layer and the lower layer are compared by shining an overlay beam on to the overlay targets and measuring the diffraction spectrum of the reflected beam. Having two sets of overlay targets with different pitches in gratings enables the measurement of overlay errors that are greater than the pitch of either one of the overlay gratings.