The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 01, 2011

Filed:

Dec. 18, 2007
Applicants:

Sayaka Tanimoto, Kodaira, JP;

Hiroya Ohta, Kokubunji, JP;

Hiroshi Makino, Kokubunji, JP;

Ryuichi Funatsu, Hitachinaka, JP;

Inventors:

Sayaka Tanimoto, Kodaira, JP;

Hiroya Ohta, Kokubunji, JP;

Hiroshi Makino, Kokubunji, JP;

Ryuichi Funatsu, Hitachinaka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

A plurality of primary beams are formed from a single electron source, the surface charge of a sample is controlled by at least one primary beam, and at the same time, the inspection of the sample is conducted using a primary beam other than this. Also, for an exposure area of the primary beam for surface charge control and an exposure area of the primary beam for the inspection, the surface electric field strength is set individually. Also, the current of the primary beam for surface charge control and the interval between the primary beam for surface charge control and the primary beam for inspection are controlled.


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