The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 23, 2010

Filed:

Jun. 06, 2008
Applicants:

Marian Mankos, Palo Alto, CA (US);

Vassil Spasov, San Jose, CA (US);

Inventors:

Marian Mankos, Palo Alto, CA (US);

Vassil Spasov, San Jose, CA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01); G01N 23/225 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus for generating a dual-energy electron beam. The apparatus includes a first electron beam source configured to generate a lower-energy electron beam, and a second electron beam source configured to generate a higher-energy electron beam. The apparatus further includes a combining device for forming the dual-energy electron beam by combining the lower-energy and higher-energy electron beams. In addition, a first controllable electron-beam deflector is configured to provide a controllable offset of a first area illuminated by the lower-energy electron beam in relation to an image data collection area, and a second controllable electron-beam deflector configured to provide a controllable offset of a second area illuminated by the higher-energy electron beam in relation to the image data collection area. A moving stage and a time delay integration detection system are utilized. Other embodiments, aspects and features are also disclosed.


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