The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2010
Filed:
Jan. 30, 2004
Masato Fukasawa, Hitachi, JP;
Masato Yoshida, Tsukuba, JP;
Naoyuki Koyama, Hitachi, JP;
Yuto Ootsuki, Hitachi, JP;
Chiaki Yamagishi, Hitachi, JP;
Kazuhiro Enomoto, Mito, JP;
Kouji Haga, Hitachi, JP;
Yasushi Kurata, Hitachi, JP;
Masato Fukasawa, Hitachi, JP;
Masato Yoshida, Tsukuba, JP;
Naoyuki Koyama, Hitachi, JP;
Yuto Ootsuki, Hitachi, JP;
Chiaki Yamagishi, Hitachi, JP;
Kazuhiro Enomoto, Mito, JP;
Kouji Haga, Hitachi, JP;
Yasushi Kurata, Hitachi, JP;
Hitachi Chemical Co. Ltd., Tokyo, JP;
Abstract
The present invention relates to a CMP polishing slurry, comprising cerium oxide particles, a dispersing agent, a water-soluble polymer and water, wherein the water-soluble polymer is a compound having a skeleton of any one of an N-mono-substituted product and an N,N-di-substituted product of any one selected from the group consisting of acrylamide, methacrylamide and α-substituted products thereof. The amount of the water-soluble polymer is preferably in the range of 0.01 part or more by weight and 10 parts or less by weight for 100 parts by weight of the polishing slurry. Thus it is possible to provide a polishing slurry and a polishing method which make it possible to polish a film made of silicon oxide or the like effectively and rapidly and further control the process therefor easily in CMP technique for flattening an interlayer insulating film, a BPSG film, an insulator film for shallow trench isolation, and other films.