The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2010
Filed:
Jul. 30, 2008
Applicants:
Martin Giles, Portland, OR (US);
Titash Rakshit, Hillsboro, OR (US);
Lucian Shifren, Hillsboro, OR (US);
Jack Kavalieros, Portland, OR (US);
Willy Rachmady, Beaverton, OR (US);
Inventors:
Martin Giles, Portland, OR (US);
Titash Rakshit, Hillsboro, OR (US);
Lucian Shifren, Hillsboro, OR (US);
Jack Kavalieros, Portland, OR (US);
Willy Rachmady, Beaverton, OR (US);
Assignee:
Intel Corporation, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01);
U.S. Cl.
CPC ...
Abstract
A process includes planarizing a microelectronic device that includes a gate stack and adjacent trench contacts. The process also includes removing a gate spacer at the gate stack and replacing the gate spacer with a dielectric that results in a lowered overlap capacitance between the gate stack and an adjacent embedded trench contact.