The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2010
Filed:
Nov. 05, 2009
Daniel C. Edelstein, White Plains, NY (US);
Panayotis C. Andricacos, Croton-on-Hudson, NY (US);
John M. Cotte, New Fairfield, CT (US);
Hariklia Deligianni, Tenafly, NJ (US);
John H. Magerlein, Yorktown Heights, NY (US);
Kevin S. Petrarca, Newburgh, NY (US);
Kenneth J. Stein, Sandy Hook, CT (US);
Richard P. Volant, New Fairfield, CT (US);
Daniel C. Edelstein, White Plains, NY (US);
Panayotis C. Andricacos, Croton-on-Hudson, NY (US);
John M. Cotte, New Fairfield, CT (US);
Hariklia Deligianni, Tenafly, NJ (US);
John H. Magerlein, Yorktown Heights, NY (US);
Kevin S. Petrarca, Newburgh, NY (US);
Kenneth J. Stein, Sandy Hook, CT (US);
Richard P. Volant, New Fairfield, CT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of forming an inductor. The method including: (a) forming a dielectric layer on a top surface of a substrate; after (a), (b) forming a lower trench in the dielectric layer; after (b), (c) forming a resist layer on a top surface of the dielectric layer; after (c), (d) forming an upper trench in the resist layer, the upper trench aligned to the lower trench, a bottom of the upper trench open to the lower trench; and after (d), (e) completely filling the lower trench and at least partially filling the upper trench with a conductor in order to form the inductor.