The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2010
Filed:
Aug. 28, 2008
Akitaka Makino, Hikari, JP;
Youji Takahashi, Kudamatsu, JP;
Minoru Soraoka, Shunan, JP;
Hideki Kihara, Kudamatsu, JP;
Susumu Tauchi, Shunan, JP;
Akitaka Makino, Hikari, JP;
Youji Takahashi, Kudamatsu, JP;
Minoru Soraoka, Shunan, JP;
Hideki Kihara, Kudamatsu, JP;
Susumu Tauchi, Shunan, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A vacuum processing apparatus includes an outer chamber comprising a vacuum container, an inner chamber in which a plasma used for processing a wafer is generated, the inner chamber being detachably disposed inside of the outer chamber, a wafer holder on which the wafer is located is disposed inside of the inner chamber, and an exhausting device disposed below the wafer holder which exhausts the inside of the inner chamber. The inner chamber is sealed in air-tight manner with respect to a space between the inner chamber and the outer chamber while the space is maintained at a vacuum pressure.