The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2010
Filed:
Nov. 03, 2006
Wataru Nagatomo, Yokohama, JP;
Hidetoshi Morokuma, Hitachinaka, JP;
Atsushi Miyamoto, Yokohama, JP;
Hideaki Sasazawa, Yokohama, JP;
Wataru Nagatomo, Yokohama, JP;
Hidetoshi Morokuma, Hitachinaka, JP;
Atsushi Miyamoto, Yokohama, JP;
Hideaki Sasazawa, Yokohama, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
In an exposure process or etching process, an image feature amount useful for estimating a cross-sectional shape of a target evaluation pattern, process conditions for the pattern, or device characteristics of the pattern is calculated from an SEM image. The image feature amount is compared with learning data that correlates data preliminarily stored in a database, which data includes cross-sectional shapes of patterns, process conditions for the patterns, or device characteristics of the patterns, to the image feature amount calculated from the SEM image. Thereby, the cross-sectional shape of the target evaluation pattern, the process conditions of the pattern, or the device characteristics of the pattern are nondestructively calculated.