The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2010
Filed:
Dec. 14, 2007
System managing gas flow between chambers of an extreme ultraviolet (euv) photolithography apparatus
Alexander N. Bykanov, San Diego, CA (US);
David C. Brandt, Escondido, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
William N. Partlo, Poway, CA (US);
Alexander N. Bykanov, San Diego, CA (US);
David C. Brandt, Escondido, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
William N. Partlo, Poway, CA (US);
Cymer, Inc., San Diego, CA (US);
Abstract
A gas flow management system may comprise a first and second enclosing walls at least partially surrounding first and second respective spaces; a system generating plasma in the first space, the plasma emitting extreme ultraviolet light; an elongated body restricting flow from the first space to the second space, the body at least partially surrounding a passageway and having a first open end allowing EUV light to enter the passageway from the first space and a second open end allowing EUV light to exit the passageway into the second space, the body shaped to establish a location having a reduced cross-sectional area relative to the first and second ends; and a flow of gas exiting an aperture, the aperture positioned to introduce gas into the passageway at a position between the first end of the body and the location having a reduced cross-sectional area.