The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2010
Filed:
Mar. 07, 2007
Susumu Tauchi, Shunan, JP;
Akitaka Makino, Hikari, JP;
Seiichi Watanabe, Hofu, JP;
Naoki Yasui, Kudamatsu, JP;
Susumu Tauchi, Shunan, JP;
Akitaka Makino, Hikari, JP;
Seiichi Watanabe, Hofu, JP;
Naoki Yasui, Kudamatsu, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The present invention provides a plasma processing apparatus or a plasma processing method that can etch a multilayer film structure for constituting a gate structure with high accuracy and high efficiency. A plasma processing method of, on processing a sample on a sample stagein a depressurized discharge room, etching a multilayer film (including a high-k and a metal gate) at 0.1 Pa or less and with the sample stagetemperature-regulated by using a pressure gaugeto be used for pressure regulation and connected to the processing room and a main pump for exhaustion
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile