The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2010
Filed:
Sep. 21, 2007
Carol Osaka Namba, Walnut, CA (US);
Po-hsin Liu, Anaheim, CA (US);
Ioulia Smorchkova, Lakewood, CA (US);
Mike Wojtowicz, Long Beach, CA (US);
Rob Coffie, Camarillo, CA (US);
Carol Osaka Namba, Walnut, CA (US);
Po-Hsin Liu, Anaheim, CA (US);
Ioulia Smorchkova, Lakewood, CA (US);
Mike Wojtowicz, Long Beach, CA (US);
Rob Coffie, Camarillo, CA (US);
Northrop Grumman Space & Mission Systems Corp., Los Angeles, CA (US);
Abstract
A method and apparatusfor detecting the height of non-flat and transparent substrates using one or more reflectorspatterned on the surface of the substrateand adjusting the position of the substrate in its holder based on measurement of the height of the reflectors in comparison to a calibration markeron the holder and using appropriate spacerswith appropriate thickness to adjust the placement of the substrate at various locations to place the greatest portion of the substrate in an optimal focal range of the lithography system.