Rob Coffie

Title: Innovations in Substrate Height Detection: The Contributions of Rob Coffie

Introduction: Rob Coffie is a notable inventor based in Camarillo, California. With a keen interest in enhancing lithography systems, Coffie has achieved recognition for his innovative approaches to the detection and adjustment of substrate height. His focus on technology and precision plays a crucial role in the advancements of semiconductor manufacturing.

Latest Patents: Coffie holds a patent for a "Method and apparatus for detecting and adjusting substrate height." This invention involves utilizing one or more reflectors that are patterned on the surface of non-flat and transparent substrates. The system adjusts the substrate's position in its holder based on the height measurements of these reflectors in comparison to a calibration marker on the holder. By employing appropriate spacers with varying thicknesses, the invention ensures optimal placement of the substrate for effective performance within lithography systems.

Career Highlights: At Northrop Grumman Space & Mission Systems Corporation, Coffie has made significant strides in his field. His unique contributions to substrate technology not only enhance operational efficiencies but also demonstrate the potential for improved manufacturing processes in high-tech industries.

Collaborations: Coffie works alongside talented colleagues, including Carol Osaka Namba and Po-Hsin Liu. Their combined expertise contributes to ongoing innovations and research initiatives within Northrop Grumman, ultimately pushing the boundaries of technology in space and mission systems.

Conclusion: Rob Coffie's inventive spirit and technical knowledge illustrate the essential role of inventors in driving innovation forward. His patent on detecting and adjusting substrate height presents a vital tool in the lithography arena. As he continues his work at Northrop Grumman, his efforts are sure to influence the future of technology and its applications.