Long Beach, CA, United States of America

Mike Wojtowicz


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: **Mike Wojtowicz: Innovator in Substrate Detection Technology**

Introduction

Mike Wojtowicz, an inventive mind based in Long Beach, California, has made notable contributions to the field of substrate detection with his innovative approaches. With a unique focus on enhancing lithography processes, Wojtowicz has secured one patent that showcases his ingenuity and technical expertise.

Latest Patents

Wojtowicz's patent, titled "Method and apparatus for detecting and adjusting substrate height," introduces a critical method for detecting the height of non-flat and transparent substrates. This invention employs one or more reflectors patterned on the surface of the substrate to measure height accurately. By comparing these measurements against a calibration marker on the holder, the system adjusts the substrate's position using appropriately sized spacers. This process ensures that the substrate is placed optimally within the focal range of the lithography system, representing a significant advancement in precision engineering.

Career Highlights

Mike Wojtowicz is currently employed at Northrop Grumman Space & Mission Systems Corporation, a leader in aerospace and defense technologies. His role at Northrop Grumman allows him to work at the forefront of innovation, contributing to advanced projects that shape the future of space exploration and defense systems.

Collaborations

In his professional journey, Wojtowicz has had the privilege of collaborating with esteemed colleagues such as Carol Osaka Namba and Po-Hsin Liu. These partnerships reflect a commitment to teamwork and knowledge sharing, further enhancing the innovative work environment at Northrop Grumman.

Conclusion

Mike Wojtowicz stands out as an influential inventor in the realm of substrate detection technology. With his innovative patent and collaborative spirit, he is poised to make further contributions to the industry, paving the way for advancements in lithography and beyond. His work not only signifies individual achievement but also exemplifies the power of innovation in driving technological progress.

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