The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2010
Filed:
Jun. 30, 2008
Carlos Mazure, Bernin, FR;
Ian Cayrefourcq, St. Nazaire les Eymes, FR;
Konstantin Bourdelle, Crolles, FR;
Carlos Mazure, Bernin, FR;
Ian Cayrefourcq, St. Nazaire les Eymes, FR;
Konstantin Bourdelle, Crolles, FR;
S.O.I.Tec Silicon on Insulator Technologies, Bernin, FR;
Abstract
The present invention relates to a method of treating a structure produced from semiconductor materials, wherein the structure includes a first and second substrates defining a common interface that has defects. The method includes forming a layer, called the disorganized layer, which includes the interface, in which at least a part of the crystal lattice is disorganized; and reorganizing the crystal lattice of the disorganized layer in order to force the defects back deeper into the first substrate.