The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 2010

Filed:

Oct. 03, 2007
Applicants:

Wen-chuan Wang, Hsinchu, TW;

Shy-jay Lin, Hsinchu County, TW;

Te-chih Huang, Chu-Bei, Shin-Chu County, TW;

Chih-ming KE, Hsinchu, TW;

Wei-yu Su, Banciao, Taipei County, TW;

Heng-hsin Liu, Yonghe, Taipei County, TW;

Tsai-sheng Gau, Hsinchu, TW;

Chin-hsiang Lin, Hsin-Chu, TW;

Inventors:

Wen-Chuan Wang, Hsinchu, TW;

Shy-Jay Lin, Hsinchu County, TW;

Te-Chih Huang, Chu-Bei, Shin-Chu County, TW;

Chih-Ming Ke, Hsinchu, TW;

Wei-Yu Su, Banciao, Taipei County, TW;

Heng-Hsin Liu, Yonghe, Taipei County, TW;

Tsai-Sheng Gau, Hsinchu, TW;

Chin-Hsiang Lin, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Detecting haze formation on a mask by obtaining an optical property of the mask and determining progress of the haze formation based on the obtained optical property.


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