The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 07, 2010

Filed:

Dec. 07, 2007
Applicants:

Pieter Renaat Maria Hennus, Peer, BE;

Frits Van Der Meulen, Eindhoven, NL;

Joost Jeroen Ottens, Veldhoven, NL;

Peter Paul Steijaert, Eindhoven, NL;

Hubert Matthieu Richard Steijns, Veldhoven, NL;

Peter Smits, Baarlo, NL;

Inventors:

Pieter Renaat Maria Hennus, Peer, BE;

Frits Van Der Meulen, Eindhoven, NL;

Joost Jeroen Ottens, Veldhoven, NL;

Peter Paul Steijaert, Eindhoven, NL;

Hubert Matthieu Richard Steijns, Veldhoven, NL;

Peter Smits, Baarlo, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/58 (2006.01); G03B 27/42 (2006.01); G03B 27/52 (2006.01);
U.S. Cl.
CPC ...
Abstract

A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part positioned around the central part. The substrate support further includes a thermal decoupler arranged to decrease heat transport between the central part and the peripheral part.


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