The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2010
Filed:
Nov. 02, 2007
Steven C. Shannon, San Mateo, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
Matthew L. Miller, Fremont, CA (US);
Olga Regelman, Daly City, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Kallol Bera, San Jose, CA (US);
Steven C. Shannon, San Mateo, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
Matthew L. Miller, Fremont, CA (US);
Olga Regelman, Daly City, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Kallol Bera, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods and apparatus for controlling characteristics of a plasma, such as the spatial distribution of RF power and plasma uniformity, are provided herein. In some embodiments, an apparatus for controlling characteristics of a plasma includes a resonator for use in conjunction with a plasma reactor, the resonator including a source resonator for receiving an RF signal having a first frequency; a return path resonator disposed substantially coaxially with, and at least partially within, the source resonator; and an outer conductor having the source resonator and the return path resonator disposed substantially coaxially with, and at least partially within, the outer conductor, the outer conductor for providing an RF ground connection.