The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2010
Filed:
Mar. 18, 2005
Akihiko Sekine, Tokyo, JP;
Ikunao Isomura, Kawasaki, JP;
Toshiyuki Watanabe, Kawasaki, JP;
Shinji Sugihara, Kawasaki, JP;
Riki Ogawa, Kawasaki, JP;
Akihiko Sekine, Tokyo, JP;
Ikunao Isomura, Kawasaki, JP;
Toshiyuki Watanabe, Kawasaki, JP;
Shinji Sugihara, Kawasaki, JP;
Riki Ogawa, Kawasaki, JP;
Kabushiki Kaisha TOPCON, Itabashi-ku, Tokyo, JP;
Abstract
A mask-defect inspection apparatus including a plurality of illumination optical systems () for illuminating different areas () on a mask () on which a pattern () is formed, an objective lens (OL) disposed to face the mask, and at least a pair of detection optical systems () each having a detection sensor () to form an image of the pattern and for receiving illumination light from each of the different areas through the objective lens, each of the detection optical systems having a mechanism () for adjusting an angle of an aperture.