The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2010
Filed:
Jan. 09, 2008
Applicants:
Yuichiro Sasaki, Osaka, JP;
Katsumi Okashita, Osaka, JP;
Keiichi Nakamoto, Osaka, JP;
Hiroyuki Ito, Chiba, JP;
Bunji Mizuno, Nara, JP;
Inventors:
Yuichiro Sasaki, Osaka, JP;
Katsumi Okashita, Osaka, JP;
Keiichi Nakamoto, Osaka, JP;
Hiroyuki Ito, Chiba, JP;
Bunji Mizuno, Nara, JP;
Assignee:
Panasonic Corporation, Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/20 (2006.01);
U.S. Cl.
CPC ...
Abstract
A plasma of a gas containing an impurity is produced through a discharge in a vacuum chamber, and a plurality of substrates are successively doped with the impurity by using the plasma, wherein a plasma doping condition of a subject substrate is adjusted based on an accumulated discharge time until the subject substrate is placed in the vacuum chamber.