The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7746447 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 29, 2010

Filed:

Dec. 22, 2005
Applicants:

Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;

Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;

Erik Roelof Loopstra, Heeze, NL;

Joost Jeroen Ottens, Veldhoven, NL;

Frederik Eduard DE Jong, Eindhoven, NL;

Inventors:
Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/52 (2006.01); G03B 27/58 (2006.01);
U.S. Cl.
CPC ...
Abstract

An immersion lithographic apparatus has a plurality of substrate holders arranged to hold substrates, each substrate holder having a conduit therein for passing a temperature control fluid. The thermal responses of the different substrate holders are calibrated and flow rates calculated and used so that all the holders return to a predetermined temperature in the same time.


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