The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2010
Filed:
Mar. 27, 2008
Xinkang Tian, San Jose, CA (US);
Manuel Madriaga, San Jose, CA (US);
Ching-ling Meng, Sunnyvale, CA (US);
Mihail Mihalov, San Jose, CA (US);
Xinkang Tian, San Jose, CA (US);
Manuel Madriaga, San Jose, CA (US);
Ching-Ling Meng, Sunnyvale, CA (US);
Mihail Mihalov, San Jose, CA (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
Provided is a method of designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet one or more signal criteria. The design of the optical metrology system is optimized by using collected signal data in comparison to the one or more signal criteria. In one embodiment, the optical metrology system is used for stand alone systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.