The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 15, 2010

Filed:

Oct. 03, 2006
Applicants:

Gary Lind, Paso Robles, CA (US);

Colin F. Smith, Half Moon Bay, CA (US);

William Johanson, Gilroy, CA (US);

Thomas M. Pratt, San Jose, CA (US);

John Mazzocco, San Jose, CA (US);

Inventors:

Gary Lind, Paso Robles, CA (US);

Colin F. Smith, Half Moon Bay, CA (US);

William Johanson, Gilroy, CA (US);

Thomas M. Pratt, San Jose, CA (US);

John Mazzocco, San Jose, CA (US);

Assignee:

Novellus Systems, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus and method for sealing and unsealing a chemical deposition apparatus in a chemical deposition process chamber includes a microvolume that has dual sealing elements at its periphery. One seal, the outer seal, is used to seal the inside of the microvolume from the main process chamber. The second (inner) seal is used to seal the inside of the microvolume from a vacuum source. The apparatus and process of the present invention has several advantages for enhanced chamber performance.

Published as:

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