The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2010
Filed:
Dec. 07, 2004
Takayuki Toshima, Nirasaki, JP;
Tadashi Iino, Nirasaki, JP;
Yusuke Saito, Nirasaki, JP;
Mitsunori Nakamori, Nirasaki, JP;
Noritaka Uchida, Tosu, JP;
Takehiko Orii, Nirasaki, JP;
Takayuki Toshima, Nirasaki, JP;
Tadashi Iino, Nirasaki, JP;
Yusuke Saito, Nirasaki, JP;
Mitsunori Nakamori, Nirasaki, JP;
Noritaka Uchida, Tosu, JP;
Takehiko Orii, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate processing method which removes an ArF resist film from a wafer having the ArF resist film. As an ultraviolet irradiation process is performed on the ArF resist film, and then an ozone gas and water vapor are fed to the ArF resist film, the ArF resist film is altered in a water-soluble state. Thereafter, the ArF resist film is removed from the substrate by feeding pure water to the ArF resist film altered into the water-soluble state.