The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2010
Filed:
Sep. 29, 2008
Bryan L. Buckalew, Tualatin, OR (US);
Jonathan D. Reid, Sherwood, OR (US);
Johanes H. Sukamto, Lake Oswego, OR (US);
Frederick Dean Wilmot, Gladstone, OR (US);
Richard S. Hill, Atherton, CA (US);
Bryan L. Buckalew, Tualatin, OR (US);
Jonathan D. Reid, Sherwood, OR (US);
Johanes H. Sukamto, Lake Oswego, OR (US);
Frederick Dean Wilmot, Gladstone, OR (US);
Richard S. Hill, Atherton, CA (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
Sonic radiation is applied to a wafer portion of the planar surface of a rotating, tilted wafer as it is being immersed into a liquid treatment bath. The portion includes the leading outer edge region of the wafer. The area of the wafer portion is significantly less than the total surface area of the planar wafer surface. Power density is minimized. As a result, bubbles are removed from the wafer surface and cavitation in the liquid bath is avoided. In some embodiments, the liquid bath is de-gassed to inhibit bubble formation.