The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 01, 2010

Filed:

May. 11, 2005
Applicants:

Sidlgata V. Sreenivasan, Austin, TX (US);

Byung J. Choi, Round Rock, TX (US);

Norman E. Schumaker, Austin, TX (US);

Ronald D. Voisin, Austin, TX (US);

Michael P. C. Watts, Austin, TX (US);

Mario J. Meissl, Austin, TX (US);

Inventors:

Sidlgata V. Sreenivasan, Austin, TX (US);

Byung J. Choi, Round Rock, TX (US);

Norman E. Schumaker, Austin, TX (US);

Ronald D. Voisin, Austin, TX (US);

Michael P. C. Watts, Austin, TX (US);

Mario J. Meissl, Austin, TX (US);

Assignee:

Molecular Imprints, Inc., Austin, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 35/08 (2006.01); B29C 41/12 (2006.01); B29C 41/52 (2006.01); B81C 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention is directed to a method of forming a layer on a region of a substrate, the method including, inter alia, positioning a liquid on the substrate; and contacting the liquid with the mold, defining a gap between the mold and the substrate, with the gap enabling positioning of the liquid by capillary forces to generate the layer over the region.


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