The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 18, 2010

Filed:

Apr. 07, 2004
Applicants:

Hiroo Kawasaki, Nirasaki, JP;

Teruo Iwata, Nirasaki, JP;

Manabu Amikura, Nirasaki, JP;

Inventors:

Hiroo Kawasaki, Nirasaki, JP;

Teruo Iwata, Nirasaki, JP;

Manabu Amikura, Nirasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B 3/28 (2006.01); F27B 5/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

A thermal processing system has a processing vessel, a support poststood on the bottom wall of the processing vessel, and a support tableinternally provided with a heating meansand supported on the support post. A workpiece W is placed on the upper surface of the support tableand is subjected to a predetermined thermal process. The upper, the side and the lower surface of the support tableare covered with heat-resistant covering membersandto prevent the thermal diffusion of metal atoms causative of contamination from the support table. thus, various types of contamination, such as metal and organic contamination, can be prevented.

Published as:
WO2004090960A1; KR20050119684A; EP1612854A1; US2006199131A1; KR100744860B1; EP1612854A4; US7718930B2;

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