The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2010
Filed:
May. 18, 2006
Steven George Hansen, Phoenix, AZ (US);
Donis George Flagello, Scottsdale, AZ (US);
Wolfgang Singer, Aalen, DE;
Bernd Peter Geh, Scottsdale, AZ (US);
Vladan Blahnik, Aalen, DE;
Steven George Hansen, Phoenix, AZ (US);
Donis George Flagello, Scottsdale, AZ (US);
Wolfgang Singer, Aalen, DE;
Bernd Peter Geh, Scottsdale, AZ (US);
Vladan Blahnik, Aalen, DE;
ASML Netherlands B.V., Veldhoven, NL;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
A lithographic apparatus includes an illumination unit including a radiation source configured to generate a radiation bundle, an illumination optics with a numerical aperture NAand an aperture system; a projection lens having a first numerical aperture NA; a support arranged between the illumination unit and the projection lens and configured to support a patterning device; a substrate support configured to support a substrate on which structures on the patterning device are imaged, wherein the first numerical aperture NAof the projection lens is smaller than the numerical aperture NAof the illumination unit.