The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2010
Filed:
Sep. 18, 2007
Kenji Suzuki, Guilderland, NY (US);
Emmanuel P. Guidotti, Barberaz, FR;
Gerrit J. Leusink, Saltpoint, NY (US);
Fenton R. Mcfeely, Ossining, NY (US);
Sandra G. Malhotra, Beacon, NY (US);
Kenji Suzuki, Guilderland, NY (US);
Emmanuel P. Guidotti, Barberaz, FR;
Gerrit J. Leusink, Saltpoint, NY (US);
Fenton R. McFeely, Ossining, NY (US);
Sandra G. Malhotra, Beacon, NY (US);
Tokyo Electron Limited, Tokyo, JP;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for increasing deposition rates of metal layers from metal-carbonyl precursors by mixing a vapor of the metal-carbonyl precursor with CO gas. The method includes providing a substrate in a process chamber of a deposition system, forming a process gas containing a metal-carbonyl precursor vapor and a CO gas, and exposing the substrate to the process gas to deposit a metal layer on the substrate by a thermal chemical vapor deposition process.