The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2010
Filed:
Feb. 26, 2007
Alexander Paterson, San Jose, CA (US);
Valentin N. Todorov, Palo Alto, CA (US);
Theodoros Panagopoulos, San Jose, CA (US);
Brian K. Hatcher, San Jose, CA (US);
Dan Katz, Saratoga, CA (US);
Edward P. Hammond, Iv, Hillsborough, CA (US);
John P. Holland, San Jose, CA (US);
Alexander Paterson, San Jose, CA (US);
Valentin N. Todorov, Palo Alto, CA (US);
Theodoros Panagopoulos, San Jose, CA (US);
Brian K. Hatcher, San Jose, CA (US);
Dan Katz, Saratoga, CA (US);
Edward P. Hammond, IV, Hillsborough, CA (US);
John P. Holland, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of processing a workpiece in the chamber of a plasma reactor includes capacitively coupling plasma source power using a ceiling gas distribution plate as the electrode while inductively coupling plasma source power through the ceiling gas distribution plate, and flowing process gas through the gas distribution plate from a gas input to plural gas injection orifices, distributing the gas flow within the gas distribution plate through a succession of arcuate paths joined at respective junctions, dividing gas flow at each junction from a first respective one of said gas flow paths into a respective pair of said gas flow paths in opposite gas flow directions, and restricting the arcuate length of each of the arcuate paths to less than half-circles.