The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2010
Filed:
Feb. 08, 2007
Gregory S. Sexton, Fremont, CA (US);
Andrew D. Bailey, Iii, Pleasanton, CA (US);
Alan M. Schoepp, Ben Lomond, CA (US);
John D. Boniface, Santa Clara, CA (US);
Gregory S. Sexton, Fremont, CA (US);
Andrew D. Bailey, III, Pleasanton, CA (US);
Alan M. Schoepp, Ben Lomond, CA (US);
John D. Boniface, Santa Clara, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
Positional relationships are established in a process chamber. A base is configured with a lower electrode surface to support a wafer, and an upper electrode has a lower surface. A drive mounted on the base has a linkage connected to the upper electrode. A fixture placed on the lower surface moves into a desired orientation of the lower electrode. With the upper electrode loosely connected by the linkage to the drive, the fixture transfers the desired orientation to the upper electrode. The linkage is tightened to maintain the desired orientation, the fixture is removed and a process exclusion insert is mounted to the upper electrode. The drive moves the upper electrode and the insert to define an inactive process zone between the upper electrode and the wafer on the lower electrode to protect a central area of the wafer during etching of a wafer edge environ around the central area.