The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2010
Filed:
Jun. 25, 2008
Takuya Sugawara, Nirasaki, JP;
Yoshihide Tada, Nirasaki, JP;
Genji Nakamura, Nirasaki, JP;
Shigenori Ozaki, Amagasaki, JP;
Toshio Nakanishi, Amagasaki, JP;
Masaru Sasaki, Amagasaki, JP;
Seiji Matsuyama, Amagasaki, JP;
Takuya Sugawara, Nirasaki, JP;
Yoshihide Tada, Nirasaki, JP;
Genji Nakamura, Nirasaki, JP;
Shigenori Ozaki, Amagasaki, JP;
Toshio Nakanishi, Amagasaki, JP;
Masaru Sasaki, Amagasaki, JP;
Seiji Matsuyama, Amagasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
In a process involving the formation of an insulating film on a substrate for an electronic device, the insulating film is formed on the substrate surface by carrying out two or more steps for regulating the characteristic of the insulating film involved in the process under the same operation principle. The formation of an insulating film having a high level of cleanness can be realized by carrying out treatment such as cleaning, oxidation, nitriding, and a film thickness reduction while avoiding exposure to the air. Further, carrying out various steps regarding the formation of an insulating film under the same operation principle can realize simplification of the form of an apparatus and can form an insulating film having excellent property with a high efficiency.