The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2010
Filed:
Sep. 19, 2006
Nobuaki Matsuoka, Koshi, JP;
Mitsuhiro Tanoue, Koshi, JP;
Shinji Okada, Koshi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A processing block Sincludes unit blocks, a BCT layer B, COT layer Band TCT layer B, for forming coating films, and further includes DEV layers B, Blayered with the unit blocks B, B, Band used as unit blocks for a developing process. Beside the unit blocks Bto B, a group G of transfer sections comprising transfer sections adapted to transfer each wafer W with each main arm Ato Aof the unit block Bto Band hydrophobicity rendering units adapted to provide a hydrophobicity rendering process to the wafer W is provided. The wafer W is transferred by a transfer arm D between the transfer sections and the hydrophobicity rendering units. In this case, since it is not necessary to transfer the wafer W to the hydrophobicity rendering unit by using, for example, a main arm Aof a COT layer B, the load on the arm Acan be reduced, thereby enhancing the carrying throughput.