The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 09, 2010

Filed:

Apr. 18, 2007
Applicants:

Voon-yew Thean, Austin, TX (US);

Marc Rossow, Austin, TX (US);

Gregory S. Spencer, Pflugerville, TX (US);

Tab A. Stephens, Buda, TX (US);

Dina H. Triyoso, Austin, TX (US);

Victor H. Vartanian, Dripping Springs, TX (US);

Inventors:

Voon-Yew Thean, Austin, TX (US);

Marc Rossow, Austin, TX (US);

Gregory S. Spencer, Pflugerville, TX (US);

Tab A. Stephens, Buda, TX (US);

Dina H. Triyoso, Austin, TX (US);

Victor H. Vartanian, Dripping Springs, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01);
U.S. Cl.
CPC ...
Abstract

A semiconductor device is provided which comprises a semiconductor layer (), a dielectric layer (), first and second gate electrodes () having first and second respective work functions associated therewith, and a layer of hafnium oxide () disposed between said dielectric layer and said first and second gate electrodes.


Find Patent Forward Citations

Thean, Voon-Yew. (2010). Method to selectively modulate gate work function through selective ge condensation and high-k dielectric layer (U.S. Patent No. 7659156). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7659156

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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