The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2010
Filed:
Dec. 12, 2003
Grant Kloster, Lake Oswego, OR (US);
Robert P. Meagley, Hillsboro, OR (US);
Michael D. Goodner, Hillsboro, OR (US);
Kevin P. O'brien, Portland, OR (US);
Grant Kloster, Lake Oswego, OR (US);
Robert P. Meagley, Hillsboro, OR (US);
Michael D. Goodner, Hillsboro, OR (US);
Kevin P. O'brien, Portland, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Method and structure for minimizing the downsides associated with microelectronic device processing adjacent porous dielectric materials are disclosed. In particular, chemical protocols are disclosed wherein porous dielectric materials may be sealed by attaching coupling agents to the surfaces of pores. The coupling agents may form all or part of caps on reactive groups in the dielectric surface or may crosslink to seal pores in the dielectric.