The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2010
Filed:
Jun. 22, 2006
Harmen Klaus Van Der Schoot, Vught, NL;
Noud Jan Gilissen, 's-Gravenzande, NL;
Peter Paul Steijaert, Eindhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Hans Jansen, Eindhoven, NL;
Marco Koert Stavenga, Eindhoven, NL;
Jan Cornelis Van Der Hoeven, Veldhoven, NL;
Bob Streefkerk, Tilburg, NL;
Hernes Jacobs, Eindhoven, NL;
Marcus Martinus Petrus Adrianus Vermeulen, Leende, NL;
Harmen Klaus Van Der Schoot, Vught, NL;
Noud Jan Gilissen, 's-Gravenzande, NL;
Peter Paul Steijaert, Eindhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Hans Jansen, Eindhoven, NL;
Marco Koert Stavenga, Eindhoven, NL;
Jan Cornelis Van Der Hoeven, Veldhoven, NL;
Bob Streefkerk, Tilburg, NL;
Hernes Jacobs, Eindhoven, NL;
Marcus Martinus Petrus Adrianus Vermeulen, Leende, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.