The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2010
Filed:
Aug. 31, 2007
Alexander N. Bykanov, San Diego, CA (US);
Alexander I. Ershov, San Diego, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
David C. Brandt, Escondido, CA (US);
Alexander N. Bykanov, San Diego, CA (US);
Alexander I. Ershov, San Diego, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
David C. Brandt, Escondido, CA (US);
Cymer, Inc., San Diego, CA (US);
Abstract
Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.