The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2010
Filed:
Feb. 09, 2007
Sayaka Tanimoto, Polo Alto, CA (US);
Hiromasa Yamanashi, Sagamihara, JP;
Muneyuki Fukuda, Kokubunji, JP;
Yasunari Sohda, Kawasaki, JP;
Sayaka Tanimoto, Polo Alto, CA (US);
Hiromasa Yamanashi, Sagamihara, JP;
Muneyuki Fukuda, Kokubunji, JP;
Yasunari Sohda, Kawasaki, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
It is to provide a technology that can quickly process many measurement points on a substrate by a primary charged particle beam. In a control system, with respect to each measurement point (irradiation position of the primary charged particle beam) on a wafer, a calculator obtains a probability of a surface potential at a relevant measurement point that is obtained from a surface potential distribution function of the wafer and is stored in a data storage unit. Based on the probability, the calculator determines an amplitude of a set parameter (for example, retarding voltage) of charged particle optics at the relevant measurement point. Then the calculator checks the focus state of the primary charged particle beam by changing the set parameter in the range of the determined amplitude, and determines the set parameter to be used for measurement.