The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2010
Filed:
Jan. 25, 2008
Bernhard Gellrich, Aalen, DE;
Paul Graeupner, Aalen, DE;
Juergen Fischer, Heidenheim, DE;
Andreas Wurmbrand, Aalen-Reichenbach, DE;
Bauke Jansen, Deurne, NL;
Bob Streefkerk, Tilburg, NL;
Christiaan Alexander Hoogendam, Westerhoven, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Bernhard Gellrich, Aalen, DE;
Paul Graeupner, Aalen, DE;
Juergen Fischer, Heidenheim, DE;
Andreas Wurmbrand, Aalen-Reichenbach, DE;
Bauke Jansen, Deurne, NL;
Bob Streefkerk, Tilburg, NL;
Christiaan Alexander Hoogendam, Westerhoven, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Carl Zeiss SMT AG, , DE;
ASML Netherlands B.V., , NL;
Abstract
An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.