The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2009
Filed:
Nov. 29, 2007
Applicants:
Akihiro Seki, Joetsu, JP;
Shigeo Tanaka, Joetsu, JP;
Katsuya Takemura, Joetsu, JP;
Tsunehiro Nishi, Joetsu, JP;
Inventors:
Akihiro Seki, Joetsu, JP;
Shigeo Tanaka, Joetsu, JP;
Katsuya Takemura, Joetsu, JP;
Tsunehiro Nishi, Joetsu, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising specific recurring units. When processed by ArF lithography, the composition is improved in resolution and forms a pattern with a minimal line edge roughness.