The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2009
Filed:
Jun. 28, 2007
Edwin Johan Buis, Belfeld, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch, NL;
Wouter Anthon Soer, Nijmegen, NL;
Edwin Johan Buis, Belfeld, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch, NL;
Wouter Anthon Soer, Nijmegen, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a radiation system constructed to provide a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap configured to trap material emanating from the radiation source. The contaminant trap includes a contaminant engaging surface arranged in the path of the radiation beam that receives the material emanating from the radiation source during propagation of the radiation beam in the radiation system. The radiation system also includes a liquid tin cooling system constructed to cooling the contaminant trap with liquid tin. The apparatus includes an illumination system configured to condition the radiation beam, a support constructed to support a patterning device configured to impart the radiation beam with a pattern in its cross-section, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate.