The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2009
Filed:
Jun. 01, 2004
Shinji Himori, Nirasaki, JP;
Shosuke Endoh, Nirasaki, JP;
Kazuya Nagaseki, Nirasaki, JP;
Tomoya Kubota, Nirasaki, JP;
Daisuke Hayashi, Nirasaki, JP;
Shinji Himori, Nirasaki, JP;
Shosuke Endoh, Nirasaki, JP;
Kazuya Nagaseki, Nirasaki, JP;
Tomoya Kubota, Nirasaki, JP;
Daisuke Hayashi, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A processing apparatus for performing a process on a surface of an object to be processed by applying a high frequency power to an electrode installed in an airtight processing chamber to convert a processing gas introduced therein into a plasma, includes a thermal transfer gas feed pathway for supplying a thermal transfer gas for controlling a temperature of the object to be processed to a minute space between the object to be processed and a holding unit installed on the electrode for attracting and holding the object to be processed through an inner portion of an insulating member disposed under the electrode. A portion of the thermal transfer gas feed pathway, which passes through the inner portion of the insulating member, is formed in a zigzag shape or a spiral shape with respect to a normal direction of a holding surface of the holding unit.