The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2009
Filed:
Jun. 22, 2006
Kazuhito Shigemori, Kyoto, JP;
Koji Kaneyama, Kyoto, JP;
Akiko Harumoto, Kyoto, JP;
Tadashi Miyagi, Kyoto, JP;
Masashi Kanaoka, Kyoto, JP;
Shuichi Yasuda, Kyoto, JP;
Kazuhito Shigemori, Kyoto, JP;
Koji Kaneyama, Kyoto, JP;
Akiko Harumoto, Kyoto, JP;
Tadashi Miyagi, Kyoto, JP;
Masashi Kanaoka, Kyoto, JP;
Shuichi Yasuda, Kyoto, JP;
Sokudo Co., Ltd., Kyoto, JP;
Abstract
A substrate processing apparatus comprises an indexer block, an edge-cleaning processing block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block and an interface block. An exposure device is arranged adjacent to the interface block of the substrate processing apparatus. In the exposure device, exposure processing is applied to a substrate by a liquid immersion method. In the edge-cleaning processing group in the edge-cleaning processing block, an edge of the substrate before exposure processing is cleaned.