The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2009
Filed:
Jan. 19, 2006
Applicants:
Douglas D. Coolbaugh, Essex Junction, VT (US);
Keith E. Downes, Stowe, VT (US);
Peter J. Lindgren, Essex Junction, VT (US);
Anthony K. Stamper, Williston, VT (US);
Inventors:
Douglas D. Coolbaugh, Essex Junction, VT (US);
Keith E. Downes, Stowe, VT (US);
Peter J. Lindgren, Essex Junction, VT (US);
Anthony K. Stamper, Williston, VT (US);
Assignee:
International Machines Corporation, Armonk, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/52 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method and semiconductor device. In the method, at least one partial via is etched in a stacked structure and a border is formed about the at least one partial via. The method further includes performing thick wiring using selective etching while continuing via etching to at least one etch stop layer.