The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2009
Filed:
Aug. 31, 2007
Ling Chen, Sunnyvale, CA (US);
Vincent W. Ku, San Jose, CA (US);
Hua Chung, San Jose, CA (US);
Christophe Marcadal, Sunnyvale, CA (US);
Seshadri Ganguli, Sunnyvale, CA (US);
Jenny Lin, Saratoga, CA (US);
Dien-yeh Wu, San Jose, CA (US);
Alan Ouye, San Mateo, CA (US);
Mei Chang, Saratoga, CA (US);
Ling Chen, Sunnyvale, CA (US);
Vincent W. Ku, San Jose, CA (US);
Hua Chung, San Jose, CA (US);
Christophe Marcadal, Sunnyvale, CA (US);
Seshadri Ganguli, Sunnyvale, CA (US);
Jenny Lin, Saratoga, CA (US);
Dien-Yeh Wu, San Jose, CA (US);
Alan Ouye, San Mateo, CA (US);
Mei Chang, Saratoga, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Embodiments of the invention provide chemical precursor ampoules that may be used during vapor deposition processes. In one embodiment, an apparatus for generating a chemical precursor gas used in a vapor deposition processing system is provided which includes a canister having a sidewall, a top, and a bottom forming an interior volume and a solid precursor material at least partially contained within a lower region of the interior volume. The apparatus further contains an inlet port and an outlet port in fluid communication with the interior volume and an inlet tube connected to the inlet port and positioned to direct a carrier gas towards the sidewall and away form the outlet port. In one example, the solid precursor contains pentakis(dimethylamido) tantalum (PDMAT). In another example, the apparatus contains a plurality of baffles that form an extended mean flow path between the inlet port and the outlet port.