The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2009
Filed:
Mar. 27, 2008
Xinkang Tian, San Jose, CA (US);
Manuel Madriaga, San Jose, CA (US);
Ching-ling Meng, Sunnyvale, CA (US);
Mihail Mihalov, San Jose, CA (US);
Xinkang Tian, San Jose, CA (US);
Manuel Madriaga, San Jose, CA (US);
Ching-Ling Meng, Sunnyvale, CA (US);
Mihail Mihalov, San Jose, CA (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
Provided is system and method for controlling a fabrication cluster using at least one parameter of a structure measured with an optical metrology system designed and configured to meet one or more signal criteria. The design of the optical metrology system is optimized by using collected signal data in comparison to set one or more signal criteria. In one embodiment, the optical metrology system is used for standalone systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing. At least one parameter determined from a signal measured using the optical metrology system is transmitted to a fabrication cluster. The at least one parameter is used to modify at least one process variable or equipment setting of the fabrication cluster.