The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2009
Filed:
Nov. 15, 2005
Seon-mee Cho, San Jose, CA (US);
Mike Barnes, San Ramon, CA (US);
Michelle Schulberg, Newton, MA (US);
George D. Papasouliotis, Sunnyvale, CA (US);
Seon-Mee Cho, San Jose, CA (US);
Mike Barnes, San Ramon, CA (US);
Michelle Schulberg, Newton, MA (US);
George D. Papasouliotis, Sunnyvale, CA (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
Methods of forming dielectric films with increased density and improved film properties are provided. The methods involve exposing dielectric films to microwave radiation. According to various embodiments, the methods may be used to remove hydroxyl bonds, increase film density, reduce or eliminate seams and voids, and optimize film properties such as dielectric constant, refractive index and stress for particular applications. In certain embodiments, the methods are used to form conformal films deposited by a technique such as PDL. The methods may be used in applications requiring low thermal budgets.