The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2009
Filed:
Dec. 12, 2006
Zong Wu Tang, Pleasanton, CA (US);
Daniel N. Zhang, San Jose, CA (US);
Juhwan Kim, Pleasanton, CA (US);
Hua Song, San Jose, CA (US);
Weiping Fang, Fremont, CA (US);
Lawrence S. Melvin, Iii, Hillsboro, OR (US);
Zong Wu Tang, Pleasanton, CA (US);
Daniel N. Zhang, San Jose, CA (US);
Juhwan Kim, Pleasanton, CA (US);
Hua Song, San Jose, CA (US);
Weiping Fang, Fremont, CA (US);
Lawrence S. Melvin, III, Hillsboro, OR (US);
Synopsys, Inc., Mountain View, CA (US);
Abstract
One embodiment provides a system for using a database to quickly identify a manufacturing problem area in a layout. During operation, the system receives a first check-figure which identifies a first area in a first layout, wherein the first area is associated with a first feature. Next, the system determines a first sample using the first check-figure, wherein the first sample represents the first layout's geometry within a first ambit of the first check-figure, wherein the first sample's geometry is expected to affect the shape of the first feature. The system then performs a model-based simulation using the first sample to obtain a first simulation-result which indicates whether the first feature is expected to have manufacturing problems. Next, the system stores the first simulation-result in a database which is used to quickly determine whether a second feature is expected to have manufacturing problems.