The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2009
Filed:
May. 05, 2005
Tza-jing Gung, San Jose, CA (US);
Xianmin Tang, San Jose, CA (US);
John Forster, San Francisco, CA (US);
Peijun Ding, Saratoga, CA (US);
Marc Schweitzer, San Jose, CA (US);
Keith A. Miller, Sunnyvale, CA (US);
Ilya Lavitsky, San Francisco, CA (US);
Tza-Jing Gung, San Jose, CA (US);
Xianmin Tang, San Jose, CA (US);
John Forster, San Francisco, CA (US);
Peijun Ding, Saratoga, CA (US);
Marc Schweitzer, San Jose, CA (US);
Keith A. Miller, Sunnyvale, CA (US);
Ilya Lavitsky, San Francisco, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A one-piece inner shield usable in a plasma sputter reactor and extending from the target to the pedestal with a smooth inner surface and supported by an annular flange in a middle portion of the shield. The shield may be used to support the RF coil used in exciting the plasma. An outer shield includes an outwardly extending flange on its end alignable with the inner shield flange, holes in correspondence to recesses in the inner shield for standoffs for the RF coil, and circumferentially arranged gas flow holes.