The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2009
Filed:
Feb. 22, 2005
Hans Eisenmann, Tutzing, DE;
Kai Peter, Friedberg, DE;
Dennis Ciplickas, San Jose, CA (US);
Jonathan O. Burrows, San Jose, CA (US);
Yunqiang Zhang Zhang, Sunnyvale, CA (US);
Hans Eisenmann, Tutzing, DE;
Kai Peter, Friedberg, DE;
Dennis Ciplickas, San Jose, CA (US);
Jonathan O. Burrows, San Jose, CA (US);
Yunqiang Zhang Zhang, Sunnyvale, CA (US);
PDF Solutions, San Jose, CA (US);
Abstract
A method comprises the steps of: (a) simulating on a processor a fabrication of a plurality of layout patterns by a lithographic process; (b) determining sensitivities of the layout patterns to a plurality of parameters based on the simulation; (c) using the sensitivities to calculate deviations of the patterns across a range of each respective one of the parameters; and (d) selecting ones of the patterns having maximum or near-maximum deviations to be used as test patterns.