The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2009

Filed:

Feb. 17, 2006
Applicants:

Indranil DE, Palo Alto, CA (US);

Kurt H. Weiner, San Jose, CA (US);

Kenichi Kanai, Palo Alto, CA (US);

Inventors:

Indranil De, Palo Alto, CA (US);

Kurt H. Weiner, San Jose, CA (US);

Kenichi Kanai, Palo Alto, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 31/305 (2006.01);
U.S. Cl.
CPC ...
Abstract

One embodiment relates to an electron beam apparatus. The apparatus includes a mechanism for moving a substrate relative to the electron beam column at a controlled speed. A probe beam gun is configured to generate a probe beam through the column, and a pre-charging beam gun configured to generate a pre-charging beam through the column. Control circuitry configured to pre-scan a scan line with the pre-charging beam at least once and to subsequently sense scan the scan line with the probe beam at least once. The control circuitry is further configured so that there is a prescribed delay time between said pre-scanning and said sense scanning of the scan line. In another embodiment, a single electron beam and a deflection system configured to deflect the electron beam into pre-scans and sense scans. Other embodiments and features are also disclosed.


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